Senior Manufacturing Engineer – Thin Film Engineering (PVD, PECVD, ALD & RIE)
ensurge
| Company | ensurge |
| Category | Engineering |
| Location | San Jose |
| Remote | On-site (inferred) |
| Employment | Not stated |
| Level | Senior |
| Salary | Not stated by the employer |
| First seen | 23 Jul 2026 (the employer did not state a posting date) |
| Last verified | 10 Aug 2026 |
| Source | Employer ATS (bamboohr) |
Description
About Ensurge Micropower
Ensurge Micropower (OSE: ENSU) is a pioneer in solid-state microbattery technology,
enabling the next generation of intelligent, connected devices. Leveraging proprietary thin-film and roll-to-roll manufacturing, Ensurge delivers safe, high-energy-density batteries for
wearables, health tech, industrial sensing, and defense applications. As our technology
transitions from development to production, disciplined manufacturing execution becomes the
differentiator.
Role Overview
Ensurge is seeking a Senior Manufacturing Engineer (IC) to own and scale the Thin-Film
Engineering processes — deposition (PVD/Sputtering, PECVD, ALD) and etch (RIE) — from
pilot through early production. This role is not just about process — it is about delivering
manufacturing results.
Responsibilities
Own daily manufacturing performance for the PVD/Sputtering, PECVD, ALD, and RIE
process areas
• Drive output, yield, uptime, and cycle time
• Support production directly — troubleshooting issues in real time
• Partner with Operations to ensure line execution meets plan
Convert R&D processes into repeatable, production-ready workflows
• Define and lock critical process parameters (CPPs) — e.g., chamber pressure, Ar/process
gas flow, RF/DC power, substrate bias, deposition rate, film stress and thickness
uniformity targets (PVD/PECVD); precursor/co-reactant pulse and purge times, cycle
count, growth per cycle (GPC), and substrate temperature (ALD); RF power, gas
chemistry (e.g., CF4/O2/Cl2), etch rate, selectivity, sidewall profile/anisotropy, DC bias,
and endpoint detection (RIE)
• Define and lock control limits and OCAPs
• Ensure processes are robust, stable, and scalable
Work with Equipment Engineering to:
• Define tool requirements (sputter cathodes/targets, PECVD chambers, ALD reactors and
precursor delivery systems, RIE/ICP-RIE chambers and endpoint detection systems,
RF/DC power supplies, vacuum, gas delivery, and abatement/scrubber systems)
• Improve reliability and uptime
• Implement process-driven upgrades
• Lead tool qualification and process acceptance
• Ensure equipment supports throughput, precision, and repeatability
Own flow from substrate input → deposition/etch → downstream handoff to assembly
• Reduce bottlenecks, WIP, and inefficiencies
• Improve line balance and production scheduling alignment
• Support layout and flow improvements as the system scales
Partner with Quality to implement:
• SPC and process control on film thickness, stress, uniformity, and conformality
• Film characterization (ellipsometry, profilometry, XRD, SEM/AFM, four-point probe) to validate deposition results against CPPs
• Traceability and data capture
Build and maintain:
• SOPs
• Process specs
• Control plans
• Ensure manufacturing is data-driven and auditable
Lead structured RCA on:
• Yield loss
• Defects
• Downtime
• Use characterization data (SEM, XRD, cross-section imaging) to root-cause excursions
• Implement sustainable fixes — not workarounds
• Drive continuous improvement aligned to operational excellence principles (standard work, DMS, etc.)
Qualifications
Required
• 7–12+ years in manufacturing engineering with thin-film deposition and etch
(PVD/sputtering, PECVD, ALD, and/or RIE) in battery, semiconductor, or thin-film
industries
• Proven experience owning manufacturing processes on the floor
• Strong track record of driving yield and throughput improvements
• Experience supporting or leading pilot → production scale-up
• Hands-on mindset — comfortable working directly with equipment, technicians, and
operators
• Working knowledge of thin-film characterization techniques (e.g., ellipsometry,
profilometry, XRD, SEM) and their use in validating and controlling deposition processes
Preferred
• Understanding of film stress engineering, plasma physics, RF coupling, and DC self-bias
• Understanding of plasma etch chemistry, selectivity, anisotropy, and endpoint detection
(RIE/ICP-RIE)
• Familiarity with ALD precursor chemistry, self-limiting surface reactions, and pulse/purge sequencing
• Vacuum systems and chamber conditioning experience
• Experience with image-based film/defect characterization (SEM, optical microscopy) and
correlating characterization data back to process control limits
• Experience with MES, traceability systems, or data-driven manufacturing
Salary Range:
$162,000-$198,000
The base salary range is specific to California. The salary of the final candidate selected for this role will be determined by a variety of factors, including, but not limited to, internal equity, experience, education, specialty, and training.